In advanced industrial applications measured in microseconds or even nanoseconds, power stability and response speed directly determine process precision. High-performance pulse power systems are engineered for high repetition rates, high voltages and extreme waveform control, positioning them as a driving core for plasma applications, laser technology and high-energy physics experiments.

Core technical advantages

The pulse power system is not a simple power supply but an integrated precision control platform combining capacitor charging technology, semiconductor switches and magnetic pulse compression using saturable reactors. The combination is designed to deliver a substantial jump in performance.

• High precision and stability: Output voltage fluctuation is reduced by a factor of 40 compared with conventional designs, while timing jitter is reduced by a factor of 55, supporting highly consistent pulse waveforms.
• Efficient energy regeneration: An integrated energy regeneration circuit improves overall operating efficiency and reduces long-term energy costs.
• Nanosecond response: The systems support output voltages in the tens of kilovolts and provide nanosecond-scale rise times for demanding physical processes.
• Proven reliability: More than 1,000 units have been deployed, demonstrating stable performance in continuous long-term operation.

Performance specifications

The platform’s key parameters cover pulse widths of 100 nanoseconds or less, repetition rates of 20 kHz and output voltages up to 120 kV. Magnetic pulse compression and semiconductor switching form the core of the system.

Industry applications

The series is used across a range of advanced plasma drive systems, supporting complex technical work in research and industrial production.

Main application scenarios

• EUV light sources and laser technology: Provides stable drive for extreme ultraviolet lithography light sources and excimer laser sources.
• Plasma processes: Supports precision experiments involving synchrotron radiation and electron or ion beam interactions with matter.
• Environmental and treatment technology: Used in exhaust gas purification, ozone generation and pulsed arc discharge shockwaves for sterilization and water treatment.
• Safety protection: Plays a key role in water-screen propagation prevention systems.

Configuration and deployment

Industrial applications place distinct demands on pulse parameters. With extensive technical experience and a large delivery record, the platform can be configured around specific operating scenarios, including pulse width, voltage, repetition rate and load compatibility.

Performance depends on the match between the power system and the load. Assessment of load impedance and environmental conditions is part of the selection process for specialized processes.